| title | ISBN-13 | year of publica-
tion | other author(s) |
|---|
| Advances in Research and Development: Homojunction and Quantum-Well Infrared Detectors: Homojunction and Quantum-Well Infrared Detectors | 978-0-12-399160-7 | 2011 | John L. Vossen |
| Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications (Volume 23) | 978-0-12-533023-7 | 1997 | " |
| Advances in Research and Development, Volume 21: Homojunction and Quantum-Well Infrared Detectors | 978-0-12-533021-3 | 1995 | " |
| Author and Subject Cumulative Index, Including Tables of Contents, Volume 25: Subject and Author Cumulative Index, Volumes 1-24 | 978-0-12-533025-1 | 1998 | Ronald Powell · Abraham Ulman · Janet Perlman |
| Contemporary Preparative Techniques | 978-0-12-533014-5 | 1989 | John L. Vossen |
| Frontiers of Thin Film Technology, Volume 28 | 978-0-12-533028-2 | 2000 | Stephen M. Rossnagel · Abraham Ulman |
| Handbook of Thin Film Devices, Five-Volume Set, Volume 1-5: Frontiers of Research, Technology, and Applications | 978-0-12-265320-9 | 2000 | Colin E.C. Wood · A. G. Perera · Deborah Taylor · Phillip Broussard · J. D. Adam |
| Mechanic and Dielectric Properties: Advances in Research and Development (Volume 17) | 978-0-12-533017-6 | 1993 | John L. Vossen |
| Non-Crystalline Films for Device Structures | 978-0-12-388715-3 | 2011 |
| Non-Crystalline Films for Device Structures, Volume 29 | 978-0-12-533029-9 | 2001 | Stephen M. Rossnagel · Abraham Ulman · V. M. Agranovich |
| Optical Characterization of Real Surfaces and Films, Volume 19: Advances in Research and Development | 978-0-12-533019-0 | 1994 | K. Vedam · John L. Vossen |
| Physics of Thin Films | 978-0-12-533011-4 | 1980 | Georg Hass |
| Physics of Thin Films: Advances in Research and Development: v. 7 | 978-0-12-533007-7 | 1974 | Georg Hass · Richard W. Hoffman |
| Physics of Thin Films: Advances in Research and Development. Volume 6. | 978-0-12-533006-0 | 1971 | Richard W. Hoffman |
| Physics of Thin Films: Advances in Research and Development, Volume 13 | 978-0-12-533013-8 | 1988 |
| Plasma Sources for Thin Film Deposition and Etching | 978-0-12-533018-3 | 1994 | John L. Vossen |
| Self-Assembled Monolayers of Thiols, Volume 24 | 978-0-12-533024-4 | 1998 | Ronald Powell · Abraham Ulman |
| Thin Films, Advances in Research and Development | 978-0-12-399592-6 | 2013 |
| Thin Films for Advanced Electronic Devices, Volume 15: Advances in Research and Development | 978-0-12-533015-2 | 1991 | John L. Vossen |
| Thin Films for Emerging Applications (Volume 16) | 978-0-12-533016-9 | 1992 | " |
| Thin Films. Modeling of Film Deposition for Microelectronic Applications, Volume 22 | 978-0-12-533022-0 | 1996 | Ronald Powell · John L. Vossen · Abraham Ulman |