| title | ISBN-13 (ISBN-10) | year of publication |
|---|---|---|
| Photomask and Next-Generation Lithography Mask Technology X: 16-18 April 2003, Yokohama, Japan | 978-0-8194-4996-2 (0-8194-4996-2) | 2003 |
| Photomask And Next-generation Lithpgraphy Mask Technology | 978-0-8194-5369-3 (0-8194-5369-2) | 2004 |