Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond (Springer Theses)

by Guilei Wang Hardcover details (USA). (see also: eBook (Kindle)) details (UK). (see also: eBook (Kindle)) details (Germany). (see also: Kindle Ausgabe) ISBN: 978-981-15-0045-9 ISBN-10: 981-15-0045-2 Springer · 2019